Substrate nanotopography affects cell adhesion and proliferation and is fundamental to the rational design of bio-adhesives, to tissue engineering and to the development of assays for in-vitro screening. Cell behavior on rough substrates is still elusive, and the results presented in the open literature remain controversial. Here, the proliferation of cells on electrochemically etched silicon substrates with different roughness and nearly similar surface energy was studied over three days with confocal and atomic force microscopy. The surface profile of the substrates is a self-affine fractal with a roughness R-a growing with the etching time from similar to 2 to 100 nm and a fractal dimension D ranging between about 2 (nominally flat surface) and 2.6. For four cell types, the number of adhering cells and their proliferation rates exhibited a maximum on moderately rough (R-a similar to 10-45 nm) nearly Brownian (D similar to 2.5) substrates. The observed cell behavior was satisfactorily interpreted within the theory of adhesion to randomly rough solids. These findings demonstrated the importance of nanogeometry in cell stable adhesion and growth, suggesting that moderately rough substrates with large fractal dimension could selectively boost cell proliferation. (C) 2010 Elsevier Ltd. All rights reserved.

Cells preferentially grow on rough substrates

Gentile F.;Tirinato L.;Battista E.;Causa F.;di Fabrizio E. M.;Decuzzi P.
2010-01-01

Abstract

Substrate nanotopography affects cell adhesion and proliferation and is fundamental to the rational design of bio-adhesives, to tissue engineering and to the development of assays for in-vitro screening. Cell behavior on rough substrates is still elusive, and the results presented in the open literature remain controversial. Here, the proliferation of cells on electrochemically etched silicon substrates with different roughness and nearly similar surface energy was studied over three days with confocal and atomic force microscopy. The surface profile of the substrates is a self-affine fractal with a roughness R-a growing with the etching time from similar to 2 to 100 nm and a fractal dimension D ranging between about 2 (nominally flat surface) and 2.6. For four cell types, the number of adhering cells and their proliferation rates exhibited a maximum on moderately rough (R-a similar to 10-45 nm) nearly Brownian (D similar to 2.5) substrates. The observed cell behavior was satisfactorily interpreted within the theory of adhesion to randomly rough solids. These findings demonstrated the importance of nanogeometry in cell stable adhesion and growth, suggesting that moderately rough substrates with large fractal dimension could selectively boost cell proliferation. (C) 2010 Elsevier Ltd. All rights reserved.
2010
Nanotopography
Cell adhesion
Cell proliferation
Fractal surfaces
Rational design
Animals
Cell Adhesion
Cell Line
Humans
Materials Testing
Microscopy, Atomic Force
Microscopy, Confocal
Silicon
Surface Properties
Tissue Engineering
Cell Culture Techniques
Cell Proliferation
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12317/80587
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