In this chapter, we present the main techniques used for micro- and nanofabrication. We start from lithographic techniques, which are widely used in several research areas as well as in industrial applications, providing detailed descriptions of optical and electron beam lithographies. Subsequently the main routes for the removal of materials (etching processes) are exposed, presenting the basics of both wet and dry etching. Then an overview of more recent techniques devoted to micro-nano-fabrication is presented, focusing the attention on cheaper solutions compared to lithographic approaches. Finally, we expose several issues concerning the fabrication of microfluidic devices.
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